The Atomic Scale Processing Focus Topic is aimed at providing a unique forum to expand the scope of atomic layer deposition (ALD) and atomic layer etching (ALE) processes towards understanding the fundamentals needed to achieve true atomic scale precision and the application of such processing on various areas of interest to the broader AVS community. The emphasis will be on synergistic efforts, across multiple AVS divisions and groups, to generate area selective processes as well as novel characterization methods to advance the field of processing at the atomic scale. We are excited to offer several sessions in collaboration with the PSTD, the TFD, as well as the EMPD, focusing on area selective deposition, atomic layer process chemistry, surface reactions, and atomic layer etching.
AP+2D+AS+EM+PS+SS+TF-MoM: Area Selective Processing and Patterning
- Christophe Vallee, SUNY POLY, Albany, “Imperfectly Perfect Materials and/or Processes as a Route for ASD”
- Rudy Wojtecki, IBM Almaden Research Center, “Peter Mark Memorial Award Talk: Reactive Inhibitory Chemistries for Area Selective Depositions and Their Application in Back End of the Line Processes”
AP+AS+EL+MS+SS-MoA: Advancing Metrology and Characterization to Enable Atomic Scale Processing
- Thomas Grehl, IONTOF GmbH, Germany, “The Thinner, the Better – Characterization of Ultra-Thin Films by Low Energy Ion Scattering (Leis)”
- Sung Park, Molecular Vista, “Nanoscale Chemical Analysis and Mapping of Atomic and Molecular Scale Processes via Infrared Photo-Induced Force Microscopy”
AP+AS+EM+HI+PS+SS+TF-TuM: Area Selective Processing and Patterning II
- John Ekerdt, University of Texas at Austin, “Low-Temperature Area-selective ALD and ALE of Pd”
- Alex Martinson, Argonne National Laboratory, “Site-selective Atomic Layer Deposition: Targeting Electronic Defects”
- Mikko Ritala, University of Helsinki, Finland, “New Precursors and Approaches to ALD and AS-ALD of Metals”
AP+PS+TF-TuA: Thermal Atomic Layer Etching
- Andreas Fischer, Lam Research Corporation, “Thermal Atomic Layer Etching: The Right Etch Technology at the Right Time”
- Gert Leusink, TEL Technology Center, America, LLC, “Thermal Atomic Layer Etch Processes in Semiconductor Manufacturing Challenges and Opportunities”
AP-TuP: Atomic Scale Processing Poster Session