Chemical and physical processes occurring at surfaces and gas-liquid, solid-liquid, and gas-solid interfaces are crucial for many applications and yet their analysis often represents grand scientific and engineering challenges. The Chemical Analysis and Imaging at Interfaces Focus Topic symposium is designed as a cross-disciplinary “melting pot” and aims to disseminate the latest developments in experimental methods and understanding of the interfacial physical and chemical processes relevant (but not limited) to materials synthesis, microfabrication, energy/catalysis research, biomedical applications, environmental sciences, and surface modifications, to name a few. In particular, in (ex-) situ/in vivo/operando chemical imaging, microscopy, and spectroscopy studies using electron, X-ray, ion, neutron beams as well as optical methods and synchrotron radiation/ free-electron lasers facilities are strongly encouraged. Attention will also be paid to correlative spectroscopy and microscopy methods, modern image/spectra processing, and AI techniques. Contributions are invited including but not limited to experimental, fundamental research, industrial R&D, novel analytical techniques/approaches, and metrology of realistic surfaces and interfaces.
CA1+AS+LS+NS+SS+VT: Environmental Interfaces
- Mark Scholossman, University of Illinois at Chicago
- Ahmet Uysal, Argonne National Laboratory, “Combining Synchrotron X-ray and SFG Spectroscopy Techniques to Illuminate Aqueous Interfaces”
CA2+2D+AS+BI+HC+LS+NS: In Situ Microscopy, Spectroscopy and Processing at Liquid-Solid-Gas Interfaces
- Si Chen, Argonne National Lab
- Thomas Mitchell Wallis, NIST, “Understanding Charge Carrier Variations on the Nanoscale using Microwave Near-Field Microscopy”
CA3+HC+LS+VT: Multiphase Interfacial Analysis and Imaging
- Keshav Dani, Okinawa Inst. Of Sci. & Tech, Japan, “Cinematography of Charge: Visualizing Surface and Interface Charge Dynamics in Semiconductor Heterostructures”
- Qiang Fu, Dalian Inst. Phys. Chem., China
CA4+AS+BI: Modeling and Multi-Dimensional Data Processing of Interfacial Processes
- Zbigniew Postawa, Jagiellonian University, Poland, “Atomic-Scale Modeling of Cluster Projectile Interactions With Liquid Interfaces”
- Alexander Tselev, University of Aveiro, Portugal
CA5+AS+SE+SS: Progress and Challenges in Industrial Applications
- Hugo Perez, DENSsolutions, Netherlands Antilles, “Advanced In-situ Transmission Electron Microscopy: A Powerful Tool for Material Science, Energy Storage & Life Science Applications”
- Anna Zaniewski, Advent Diamond, Inc.
CA6+2D+AS+SE+SS: Novel Developments and Applications of Interfacial Analysis
- Ann C. Chiaramonti Debay, NIST
- Takahide Yamaguchi, National Institute for Materials Science, Japan
CA7: Chemical Analysis and Imaging Interfaces Poster Session