The Advanced Ion Microscopy & Ion Beam Nano-Engineering Focus Topic targets advancement in focused ion beam technologies and applications. The renaissance of novel ion beam technologies in the recent years brought unique opportunities in microscopy, nano-fabrication, metrology, material engineering, and novel analytical techniques. With origins in Gas Field Ion Source Helium Ion Microscopy (GFIS-HIM), this session has expanded to include the full spectrum of charged particle beams and sources including Liquid Metal Ion Source (LMIS), a breadth of solid state and alloy sources, plasma-cusp ion sources, cold beams, and neutral beams, for a broad range of research and applications.
HI1+AS: Advanced Ion Microscopy & Surface Analysis
- Frances Allen, University of California, Berkeley, “Defect Engineering on the Atomic Scale with the Helium Ion Microscope”
- Florian Vollnhals, Institute for Nanotechnology and Correlative Microscopy INAM, Germany, “Correlative Microscopy using HIM and HIM/SIMS”
HI2: Novel Beam Induced Material Engineering and Nano Patterning
- Rantej Bali, HZDR-Helmholtz-Zentrum Dresden-Rossendorf, Germany, “Anisotropic Effects in Embedded Magnetic Nanostructures Achieved Using Focused Ion Beams”
- Rosa Cardoba, U. De Valencia, Spain
HI3: Emerging Ion Sources and Optics
- Edward Bielejec, Sandia National Lab, “Novel Source Development for Focused Ion Beam Implantation and Irradiation”
HI4: Advanced Ion Microscopy Poster Session