Call for Abstracts Deadline:
Abstract Submission Guidelines
Please review Steps 1-5 below before entering the online abstract submission site.
Step 1
Before signing up or logging into the online system (in Step 5), please review all of the following steps to ensure you have the information needed to complete the abstract submission process.
Please Note the Following Requirements Prior to Submission:
- If you are planning to submit multiple abstracts, presenters are limited to one oral and one poster presentation.
- If you already have accepted abstracts scheduled in the program, please note that you can only have one oral and one poster in the program total so please keep this in mind when submitting a late breaking abstract.
Step 2
Select a a session topic from the list below. Note that all sessions have Late Breaking Oral, Late Breaking Poster, and Late Breaking On Demand submission options (except the undergraduate poster session)
Step 3
Fill out the abstract content and author details in the system (abstract 2,700 characters max. including grammar and spacing; you may also submit a supplemental 1 page PDF file containing any graphs, charts or pictures you wish to include).
Step 4
Agree to the copyright agreement. If you have questions e-mail yvonne@avs.org.
STEP 5
Due by 11:59 p.m. ET
Author Notification
Acknowledgment that your abstract has been submitted will follow by e-mail shortly after submission. Notifications regarding late breaking acceptances will be sent by e-mail by Mid-September.
Topics
2D Materials (2D)
- 2D1+AS+EM: Electron Microscopy and Photoemission Spectroscopy
- 2D2+AS+NS+SS: Scanning Probe Microscopy and Spectroscopy
- 2D3+EM: Electronic, Mechanical, and Optical Properties
- 2D4+EM+MI: Charge Density Waves, Magnetism, and Superconductivity
- 2D5+AS+SS: Defects, Dopants, Edges, Functionalization, and Intercalation
- 2D6+MI: Heterostructures, Twistronics, and Proximity Effects
- 2D7+AS+BI+HC+SS: Biological, Electronic, Energy, and Other Applications
- 2D8+EM+MI: Electron and Spin Transport
- 2D9+NS+QS: Symmetry-Protected and Quantum Properties
- 2D10: Novel Materials
Actinides and Rare Earths (AC)
- AC1+LS+MI: Magnetism, Electron Correlation, and Superconductivity in the Actinides/Rare Earths
- AC2+LS+MI: Chemistry and Physics of the Actinides/Rare Earths
- AC3+AS+LS: Emerging Topics and Methods in Actinide/Rare Earth Science
- AC4+LS+MI: Actinide/Rare Earth Theory
- AC5: Actinides and Rare Earths Poster Session
Advanced Ion Microscopy & Ion Beam Nano-Engineering (HI)
- HI1+AS: Advanced Ion Microscopy & Surface Analysis
- HI2: Novel Beam Induced Material Engineering and Nano Patterning
- HI3: Emerging Ion Sources and Optics
- HI4: Advanced Ion Microscopy Poster Session
Advanced Surface Engineering (SE)
- SE1+MN+PS+TF: Vapor Deposition Technologies and New Trends in Surface Engineering
- SE2+AS+BI+SS+TF: Nanostructured and Multifunctional Thin Films and Coatings
- SE3+AS+MN+SS: Mechanical and Tribological Properties of Thin Films and Coatings
- SE4+MN+PS: Advanced Coatings for Hypersonics and Other Harsh Aerospace Environments
- SE5: Advanced Surface Engineering Poster Session
Applied Surface Science (AS)
- AS1+EL+EM+LS+SE+SS: Quantitative Surface Analysis
- AS2+BI+CA+HC+LS+PS+SE+SS: Analysis of Surfaces and Interfaces Related to Energy and the Environment
- AS3+2D+EM+MS+NS+SS+TF: Probing Defects at Surfaces and Interfaces
- AS4+AC+BI+CA+HI: Unraveling the Composition of Complex Systems with SIMS
- AS5+AP+EM+SE: Surface Analysis Using Complementary Techniques
- AS6+LS+RE+SS: Probing Surface and Interface Structure with X-ray Photoelectron Spectroscopy: In Memory of Charles Fadley
- AS7+LS+RE+SS: Synchrotron-Based Photoelectron Spectroscopy Studies of Technologically Important Materials: in Memory of David Shirley
- AS8+CA+HC+LS: Shining a Light on Surface Chemical Metrology: in Memory of Martin Seah
- AS9: Applied Surface Science Poster Session
Atomic Scale Processing (AP)
- AP1+AS: Area Selective Processing and Patterning
- AP2+AS+EL+MS+SS: Advancing Metrology and Characterization to Enable Atomic Scale Processing
- AP3+2D+PS+TF: Atomic Layer Processing: Integration of Deposition and Etching for Advanced Material Processing
- AP4+AS+HI+PS+SS: Beam Studies / Surface Reaction Analysis and Emerging Applications of Atomic Scale Processing
- AP5+TF: Thermal Atomic Layer Etching
- AP6: Atomic Scale Processing Poster Session
Biomaterial Interfaces (BI)
- BI1+AS+PS: Microbes and Fouling at Surfaces
- BI2+AS+PS: Biomolecules and Biophysics at Interfaces
- BI3+AS: Characterization of Biological and Biomaterials Surfaces
- BI4+AS+EM+NS+SE+TF: Bioanalytics, Biosensors and Diagnostics
- BI5+SE: Biomaterials and Nanomaterials Fabrication
- BI6+AS+HC+SS: Biology for Our Energy Future
- BI7+AS: Perfectly Imperfect Biology: Reproducibility in Biological Surface Science
Chemical Analysis and Imaging Interfaces (CA)
- CA1+AS+LS+NS+SS+VT: Environmental Interfaces
- CA2+2D+AS+BI+HC+LS+NS: In Situ Microscopy, Spectroscopy and Processing at Liquid-Solid-Gas Interfaces
- CA3+HC+LS+VT: Multiphase Interfacial Analysis and Imaging
- CA4+AS+BI: Modeling and Multi-Dimensional Data Processing of Interfacial Processes
- CA5+AS+SE+SS: Progress and Challenges in Industrial Applications
- CA6+2D+AS+SE+SS: Novel Developments and Applications of Interfacial Analysis
- CA7: Chemical Analysis and Imaging at Interfaces Poster Session
Electronic Materials and Photonics (EM)
- EM1+BI+NS+PS+TF: Electronic and Photonic Materials and Devices
- EM2+MS: Artificial Intelligence and Machine Learning to Accelerate Development of Electronic and Photonic Materials and Devices
- EM3+MN+TF: Wide and Ultra Wide Band Gap Materials and Devices
- EM4+AS+NS+SS: Defect Engineering in Electronic & Photonic Materials & Devices
- EM5+MN+NS: Piezoelectric, Ferroelectric, and Multiferroic Devices & Microelectronics
- EM6: Devices & Materials for Logic, Memory, and Interconnects
- EM7+EL+NS: Computational Origins of Electronic & Photonic Defects
- EM8+AS: Hybrid Perovskite Materials, Processing, Characterization, and Devices
- EM9: Electronic Materials and Photonics Poster Session
Fundamental Discoveries in Heterogeneous Catalysis (HC)
- HC1+AS+SS: Mechanisms and Reaction Pathways in Heterogeneously-Catalyzed Reactions
- HC2+AS+NS+SS: Making Imperfections Count: Design and Characterization of Catalytic Surfaces
- HC3+AS+SS: Bridging Gaps in Heterogeneous Catalysis
- HC4+AS+SS: Ambient Pressure Studies of Heterogeneous Catalysis
- HC5+AS+SS: Advances in Heterogeneous Electrocatalysis
- HC6+AS+SS: Single-Atom Catalysis
- HC7+AS+SS: Development and Characterization of New Materials for Catalysis
- HC8+AS+SS: Photocatalysis
- HC9: Heterogenous Catalysis Poster Session
Magnetic Interfaces and Nanostructures (MI)
- MI1: Topological Insulator Heterostructures
- MI2: Spin Landscape I (Magnetic Structures in Real and Momentum Space)
- MI3: Spin Landscape II (Magnetic Structures in Real and Momentum Space)
- MI4+2D+TF: Quantum Materials (2D)
- MI5: Special Session “Emerging Researchers Attracted by Magnetism
- MI6: Magnetic Interfaces and Nanostructures Poster Session
Manufacturing Science and Technology (MS)
- MS1+HI: Machine Learning for Microelectronics Manufacturing Process Control
- MS2+AP+AS+TF: Advanced Characterization and Metrology for
- MS3+HI: Machine Learning for Materials’ Discovery
- MS4: Manufacturing Science and Technology Poster Session
MEMS and NEMS (MN)
- MN1: MEMS Technology for Sensing and Frequency Control
- MN2+2D: Emerging Materials for MEMS/NEMS Devices
- MN3+AS+NS+SE: Scanning Probe Study in MEMS/NEMS
- MN4+QS: Dynamics and Nonlinearity in MEMS
- MN5+SE: MEMS and BioMEMS Processes, Materials, and Devices
- MN6: Hybrid M/NEMS and M/NEMS Heterogeneous Integration
- MN7: MEMS and NEMS Poster Session
Mini Symposium on 2D Materials Synthesis (MS-2DMS)
- MS-2DMS1+2D+EM+NS: Direct Growth of 2D Materials, Including CVD and MBE
- MS-2DMS2+2D+EM+NS: Integration of 2D Materials With Dissimilar Materials
- MS-2DMS3+2D+EM+NS: Synthesis and Characterization of Nanostructured Materials: Nanoribbons, 2D Polymers and Van Der Waals Materials
Nanoscale Science and Technology (NS)
- NS1+AP+BI: Fabrication and Operation of Nano-Systems
- NS2+BI: Nanopore Sensing and Fabrication, Operation and Metrology of Biodevices
- NS3+QS: Fabrication, Testing and Metrology of Quantum Devices and Systems
- NS4+EM+TF: Nanophotonics, Metasurfaces and Plasmonic Systems Including Inverse Design Methods
- NS5+AP+BI+SS: Frontiers in Scanning Probe Microscopy Including Machine Learning
- NS6+AS+EM: Scanning Probe Metrology of 1D and 2D Materials
- NS7+AS+EM: Correlative Microscopy for Nanoscale Characterization
- NS8+AS+EM+SS: Quantum Based Sensors and Metrology
- NS9+QS: Open Science Discussion Session (Open Data (SS Spectra), Open Teaching Materials, Sharing)
- NS10: Nanoscale Science and Technology Poster session
New Trends on Structural and Electronic Characterization of Materials, Interfaces, and Surfaces (LS)
- LS1+2D+AS+EM+MI+QS+TF: Information and Technology
- LS2+2D+AS+EM+QS+SS: Operando Catalysis and Energy Systems
- LS3+CA+SE+SS: Extreme Conditions: High Pressure, Temperature, High Magnetic Fields
- LS4+2D+AS+TF: Role of Defects in Materials
- LS5: New Trends on Structural and Electronic Characterization of Materials, Interfaces, and Surfaces Using Synchrotron and FEL-Based Radiation Sources Poster Session
Plasma Science & Technology (PS)
- PS1: Advanced BEOL: Interconnect Materials and Etching
- PS2+AP: Advanced FEOL: Plasma Processing for Logic Devices
- PS3+NS: Advanced Plasma Patterning: EUV-Based, Multipatterning and Alternative Patterning Approaches (Imprint, DSA, Etc.)
- PS4+TF: Plasma Processing for Advanced Emerging Memory Technologies, Advanced Packaging and Heterogeneous Integration
- PS5+TF: Plasma Processes of Non-Silicon Related Semiconductors for Energy-Efficient Devices in Power, Photovoltaics and Optoelectronics Applications
- PS6+AP: Plasma Assisted Atomic Layer Etching
- PS7+AP+TF: Plasma Deposition and ALD Processes for Coatings and Thin Films
- PS8+SE: Plasma Sources, Diagnostics, Sensors and Control
- PS9: PSTD Award Lectures (ALL INVITED SESSION)
- PS10+MS: Modelling of Plasmas and Plasma Driven Processes, and Machine Learning
- PS11+AS+SS: Plasma-Surface Interactions
- PS12: Plasmas for the Environment and Sustainability: Plasmas-Liquid Interactions, Water, Air, Soil Treatment
- PS13+AS: Plasma Chemistry and Catalysis
- PS14+BI+SM: Plasma for Antimicrobial Treatment, Medicine, and Biointerfaces
- PS15+SE: Atmospheric Pressure Plasmas and their Applications
- PS16: Plasma Science and Technology Poster Session
Quantum Information Science (QS)
- QS1+EM+MN+NS: Systems and Devices for Quantum Information
- QS2+EM+MN+NS+SS: Systems and Devices for Quantum Computing
- QS3+EM+MN+NS+SS: High Coherence Qubits for Quantum Computing
- QS4+2D+EM+MN+NS: SiGe, SiC and Related Materials for Quantum Information Sciences
- QS5+EM+MN+NS: The Quantum Metrology Revolution
- QS6+EM+NS+VT: Color Centers: from Materials to Quantum Technologies
- QS7+EM+MN+NS+SS: Quantum Information Science Poster Session
Radiation Effects on Materials (RE)
- RE1+AS+SS: Radiation and Bioactive Materials, Surfaces, and Interfaces
- RE2: Radiation in Space/Natural Radiation
- RE3+AS: Materials Analysis and Characterization with Radiation
- RE4: Radiation Effects on Materials Poster Session
Smart Multifunctional Materials for Nanomedicine (SM)
- SM1: Theranostics and Nanomedicine
- SM2: Plasma Chemistry (and Their Appropriate Plasma Reactors) for Multifunctional (Nano)Biomaterials
- SM3: Wound Healing and Tissue Repair
- SM4: Smart Multifunctional Materials for Nanomedicine Poster Session
Spectroscopic Ellipsometry (EL)
- EL1+AS+EM: Optical Characterization of Thin Films and Nanostructures
- EL2+AS+EM: Emerging Technological Advances and Breakthroughs of Spectroscopic Ellipsometry
- EL3+EM: Spectroscopic Ellipsometry: Novel Applications and Theoretical Approachess
- EL4: Spectroscopic Ellipsometry Poster Session
Surface Science (SS)
- SS1+AS+TF: Dynamics and Mechanisms at Surfaces and Interfaces
- SS2+2D+AS: Structure, Adsorption and Reaction at 2D Material Surfaces
- SS3+AS: Environmental, Atmospheric and Astronomical Surfaces
- SS4: Liquid/Solid Interfaces and Electrochemistry
- SS5+AS+HC: Oxide and Chalcogenide Surface Reactivity
- SS6+AS+TF: Oxide and Chalcogenide Surfaces and Interfaces
- SS7+AS+SE: ALD Surface Chemistry
- SS8+AS: Molecular Organization at Surfaces
- SS9+HC: Dilute Alloys, Doped Materials, Multi-component Clustering
- SS10+AS+HC: Nanoparticle Surfaces
- SS11+AS: Memorial Session in Honor of Patricia Thiel I (ALL-INVITED SESSION)
- SS12+AS: Memorial Session in Honor of Patricia Thiel II (ALL-INVITED SESSION)
- SS13: Surface Science Poster Session
Thin Films (TF)
- TF1+AP: Manufacturing and Scale-Up of CVD and (Spatial) ALD
- TF2+AP+SE+SS: ALD and CVD: Surface Reactions, Mechanisms and Kinetics
- TF3+PS: Hipims for Emerging and Advanced Materials
- TF4: Solution Based Thin Film Deposition Techniques
- TF5+AP: Novel ALD CVD Precursors, Processes, Deposited Morphologies and Substrate Architectures
- TF6: Perfectly Imperfect Oxides: Imperfect Stoichiometry, Perfect Performance
- TF7+EM: Microelectronics Application
- TF8+2D: Low Dimension Material Application
- TF9: Energy Generation Application
- TF10: ALD for Batteries
- TF11+EM: Thin Film for Spintronics
- TF12: Perfectly Imperfect Heusler Alloys for Spintronics
- TF13+SE+SS: Nucleation and Interface Phenomena in Thin Films
- TF14+MS: Simulations and Machine Learning Applications for Thin Films
- TF15+AS: In-Situ Characterization of Thin Films and Interfaces
- TF16: Growth in 3D, High Aspect Ratio and Nanostructured Materials
- TF17+EM: Wide and Ultra-Wide Bandgap Thin Films: Advances in Deposition and Novel Materials
- TF18+SE: Vapor Deposition and Vapor Infiltration of Organic, Polymeric, and/or Hybrid Materials
- TF19+EM: Thin Films for Optics, Photonics, and Metamaterials
- TF20+EM: Thin Films for Soft Electronics
- TF21: Thin Film Poster Session
Vacuum Technology (VT)
- VT1: Vacuum Measurement, Partial Pressure, and Gas Analysis
- VT2: Vacuum Pumping and Extreme High Vacuum
- VT3: Gas Dynamics, Modeling, and Simulation
- VT4: Leaks, Flows, and Material Outgassing
- VT5: Aerospace and Large Vacuum System
- VT6: Accelerators
- VT7: Particle Control, Quality Control, Ultraclean Systems
- VT8: Vacuum Technology for Quantum Applications
- VT9: Vacuum Technology for Fusion Research
- VT10: Imperfectly Perfect Materials
- VT11: Vacuum Technology Poster Session