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Division: Applied Surface Science (AS)

The Applied Surface Science Division (AS) is the premier gathering place for the global community of scientists and engineers who perform research in the preparation, characterization, modification, and utilization of surfaces and interfaces for applications of practical importance. At this year’s symposium, contributors will present fundamental research along with cutting-edge applied studies in nanoscience, materials for energy conversion, semiconductor processing, polymers, biotechnology, and more. The session topics include “Quantitative Surface Analysis” (MoA), “Surface Analysis Using Complementary Techniques” (TuA), “Analysis of Surfaces and Interfaces Related to Energy and the Environment” (WeM), “Unraveling the Composition of Complex Systems with SIMS” (ThM), and “Probing Defects at Surfaces and Interfaces” (ThA). Each session will include one of more invited talks from world-renowned researchers. The division will also sponsor a poster session on Thursday evening. Unfortunately, three pioneers of the Applied Surface Science community have passed away recently.To honor the many decades of significant contributions that these scientists have made, a memorial session will be held for each scientist. These sessions include “Probing Surface and Interface Structure with X-ray Photoelectron Spectroscopy: in Memory of Charles Fadley” (MoM), “Synchrotron-Based Photoelectron Spectroscopy Studies of Technologically Important Materials: in Memory of David Shirley” (TuM), and “Shining a Light on Surface Chemical Metrology: in Memory of Martin Seah” (WeA). This year’s winner of the Peter M.A. Sherwood Mid-Career Award is Prof. Mark Biesinger, and he will be giving his invited talk “Advancing X-ray Photoelectron Spectroscopy (XPS) Methodologies for Materials Research” at the Martin Seah memorial session. In addition, the division will hold its annual Business Meeting and Awards Ceremony on Tuesday evening.Highlights of this event include the ASTM Committee E42 on Surface Analysis forum on rigor and reproducibility in surface analysis: addressing the (in)adequacy of data and analysis reporting. All members of the Applied Surface Science community are invited to attend.

AS+CA+EL+EM+LS+SE+SS-MoA: Quantitative Surface Analysis

  • David Cant, National Physical Laboratory, UK, “Hard Targets : Developing Tools for Quantitative HAXPES”

AS+BI+CA+HC+LS+PS+SE+SS-WeM: Analysis of Surfaces and Interfaces Related to Energy and the Environment

  • Svitlana Pylypenko, Colorado School of Mines, “Analysis of Surfaces and Interfaces in Polymer Electrolyte Membrane Fuel Cell and Electrolyzer Devices”

AS+2D+EM+MS+NS+SS+TF-ThA: Probing Defects at Surfaces and Interfaces

  • Nayon Park, University of Washington, “Controlling InP Quantum Dot Surface Defects Using ALD-inspired Surface Chemistry and Phosphorus Kα and Kβ X-ray Emission Spectroscopy”

AS+AC+BI+CA+HI-ThM: Unraveling the Composition of Complex Systems with SIMS

  • Birgit Hagenhoff, Tascon GmbH, Germany, “Unraveling the Composition of Complex Systems with SIMS”
  • Christopher Szakal, National Institute of Standards and Technology (NIST), “Innovations in Nuclear Materials Analysis with SIMS”

AS+EM+SE-TuA: Surface Analysis Using Complementary Techniques

  • Brian Gorman, Colorado School of Mines, “Progress Towards Atomic Scale Analytical Tomography”
  • Alexander Gray, Temple University, “Origins of the Emergent Phenomena at Oxide Interfaces Studied with Complementary X-Ray Spectroscopic and Scattering Techniques”

AS+LS+RE+SS-MoM: Probing Surface and Interface Structure with X-ray Photoelectron Spectroscopy: in Memory of Charles Fadley

  • Martina Mueller, University of Konstanz, Germany, “Hard X-ray Photoelectron Spectroscopy of Tunable Oxide Interfaces”
  • Bongjin Simon Mun, Gwangju Institute of Science and Technology, Republic of Korea, “Study of Surface Oxides on Pt3Ni(111) and Pt3Co(111) using Ambient Pressure XPS”

AS+LS+RE+SS-TuM: Synchrotron-Based Photoelectron Spectroscopy Studies of Technologically Important Materials: in Memory of David Shirley

  • Paul S. Bagus, University of North Texas, “Origin of the Complex Main and Satellite Features in Oxides”
  • Günter Kaindl, Freie Universität Berlin and DESY Hamburg, Germany, “David A. Shirley – Pioneer of Synchrotron Radiation Science and International Cooperation”
  • Eric L. Shirley, NIST, “On Photoelectron Spectroscopy and the Shirley Background”
  • Stan Williams, University of Texas at A&M, “XUV Photoemission and Absorption Spectroscopies to Understand Electrical Switching in Neuromorphic Materials”

AS+CA+HC+LS-WeA: Shining a Light on Surface Chemical Metrology: In Memory of Martin Seah

  • Don Baer, Pacific Northwest National Laboratory, “Complementary Perspectives on the Impacts of Martin Seah on Surface Analysis”
  • Mark Biesinger, Surface Science Western, Canada, “ASSD Peter Sherwood Mid-Career Award Talk: Advancing X-ray Photoelectron Spectroscopy (XPS) Methodologies for Materials Research”
  • Ian Gilmore, National Physical Laboratory, UK, “Metrology Lights the Way for Advances in Metabolic Imaging at the Single-cell Scale”

AS-ThP: Applied Surface Science Poster Session

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Key Dates

Major Awards Deadline:
March 31, 2022

Student Awards Deadline:
May 31, 2022

Late-Breaking Abstract Submission Deadline:
September 12, 2022

Early Registration Deadline:
September 30, 2022

Hotel Deadline Extension:
October 26, 2022

Contact

Yvonne Towse
Conference Administrator
125 Maiden Lane; Suite 15B
New York, N.Y. 10038
yvonne@avs.org

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