The Plasma Science & Technology (PSTD) program highlights state-of-the-art advances in plasma science and associated applications, ranging from fundamental studies of plasma physics and chemistry, plasma-matter interactions to new and advanced applications in plasma processing. Our diverse international community includes researchers from academia, national laboratories, and industry covering topics extending from the latest advancements in basic and applied research for established fields such as semiconductor fabrication to novel and emerging applications, where plasma is either the focus or the enabling tool. One of the exciting features of this year’s program is that we have been able to invite back some of the prominent PSTD students from years past to give updates on current plasma research.
The program extends over the entire week and includes oral sessions in the morning and afternoon. We start our week by talks on plasmas for sustainability as well as plasma chemistry and catalysis. We also expect that our community will be excited to visit the talks in the Atomic Layer Processing (AP) Focus Topic or the Manufacturing Science (MS) Group on Monday. On Tuesday, we will expand our program into two parallel sessions throughout the week, where you will find topics associated with: modeling of plasmas; machine learning; plasma-surface interactions; the development and applications of atmospheric pressure plasmas; Advanced Memory; advanced packaging, and heterogeneous Integration; plasma-assisted etching and deposition; plasma processing for non-Si related semiconductors and related materials; plasma source development, characterization, and control. On Thursday we will host one single session highlighting recent advances in plasmas for semiconductor applications as well as a special session highlighting Plasma talks from National awards (Ruzic – 2020 Gaede-Langmuir Award), Divisional awards (Overzet – 2021 Plasma Prize), and our newly created Young Investigator Award (Peeters – 2021 YI award). Folks interested in other applications may find the Smart Multifunctional Materials for Nanomedicine (SM) Focus topic on Wednesday morning or the Quantum Science (QS) Focus topic on Wednesday and Thursday interesting as well. Our poster session on Tuesday covers all topics noted above in a relaxed environment conducive to extended discussion with the presenters.
Each session includes one or more invited lectures given by a well-recognized subject matter expert along with numerous contributed talks. The program will also feature talks by the PSTD Plasma Prize and Young Investigator Award winners of the past three years along with student finalists for this year’s Coburn and Winters Award.
PS-ThA: Harnessing the Power of Plasmas for Real-World Applications: PSTD Award Lectures
- Lawrence Overzet, University of Texas at Dallas, “PSTD Plasma Prize Award Talk: Plasma ON then OFF, ON – OFF, ON – OFF, ON – OFF: Who Knew Being Indecisive Could Work So Well!”
- Floran Peeters, DIFFER, Netherlands, “PSTD Young Investigator Award Talk: Next Generation “Birkeland-Eyde”: From NH3 to NO”
- David Ruzic, University of Illinois, ” Time-Resolved Energy and Ion Energy Distributions during High-Powered Impulse Magnetron Sputtering (HIPIMS) with Cathode Voltage Reversal “
PS-ThM: Plasma Processing for Advanced Semiconductor Devices
- Yun Han, TEL Technology Center, America, LLC, “FEOL Plasma Etch Challenges in 3D Logic Device Fabrication”
- Yohei Ishii, Hitachi High-Tech America, Inc., “Dry Etch Solution to a Challenge in Si/SiGe Dual Channel Process Integration”
- Theo Standaert, IBM Research Division, Albany, NY, “Plasma Etch Fundamentals and Engineering: Advancing Interconnect Scaling”
PS1+AP-WeA: Plasma Assisted Atomic Layer Etching
- Dominik Metzler, IBM Research Division, Albany, NY, “Use of Atomic Layer Etching Techniques in Todays and Tomorrows Industry”
PS1+AP+TF-WeM: Plasma Deposition and ALD Processes for Coatings and Thin Films
- Silvia Armini, IMEC, Belgium, “Area-Selective Deposition: A Bottom-Up Approach to Nanoelectronics Fabrication”
PS2+TF-WeM: Low-Damage Etching of Nitride Semiconductors Utilizing Photo-Electrochemical Reactions
- Taketomo Sato, Hokkaido University, Japan, “Low-Damage Etching of Nitride Semiconductors Utilizing Photo-Electrochemical Reactions”
PS1+NS-TuM: Advanced Plasma Patterning: EUV-Based, Multipatterning and Alternative Patterning Approaches (Imprint, DSA, Etc.)
- Nicolas Gosset, Air Liquide Laboratories, Japan, “Achieving Better Etching Performance with Lower GWP Gases”
- Katie Lutker-Lee, TEL Technology Center, America, LLC, “EUV Patterning: Plasma Processing Innovations for Single Exposure and Multi-Patterning”
PS1+TF-TuA: Plasma Processing for Advanced Emerging Memory Technologies, Advanced Packaging, and Heterogeneous Integration
- Shreya Kundu, IMEC, Belgium, “Patterning Approaches for Integration of Complex Metal Alloys Towards Advanced Memory and Compute Applications”
PS2+SE-FrM: Plasma Sources, Diagnostics, Sensors, and Control
- Jean-Paul Booth, LPP-CNRS, France, “What We Still Won’t Know About Plasmas in Simple Diatomic Gases- or Using a DC Glow Discharge in Pure O2 as an Ideal Test-Bed for Experimental Validation of Models”
- Gilles Cunge, LTM/CNRS-UJF, France, “Optical and Electrical Diagnostics of Industrial Plasma Reactors: Measuring the Relevant Physical Quantities to Assist Process Development”
PS2+MS-TuM: Modelling of Plasmas and Plasma Driven Processes, and Machine Learning
- Yu-Hao Tsai, TEL Technology Center, America, LLC, “Nanosheet GAA Transistor Manufacturing Modeling Study: Build Fundamental Knowledge of SiGe to Si Selective Etching in ClF3 Gas”
PS2+AS+SS-TuA: Plasma-Surface Interactions
- Miyako Matsui, Hitachi Ltd., Japan, “Selective Mask Deposition Using SiCl4 Plasma for a Highly Selective Etching Process”
PS-MoM: Plasmas for the Environment and Sustainability: Plasmas-Liquid Interactions, Water, Air, Soil Treatment
- Patrick Cullen, University of Sydney, Australia, “Plasma Bubbles: A Route to Sustainable Chemistry”
- Ellen Fisher, University of New Mexico, “Merging the Fundamental and Applied: Understanding Plasma Kinetics and Energetics to Build Better Mousetraps”
PS2+SE-WeA: Atmospheric Pressure Plasmas and their Applications
- Eun Ha Choi, Plasma Bioscience Research Center, Kwangwoon University, Republic of Korea, “Nonthermal Atmospheric Pressure Plasma Sources for Plasma Bioscience, Medicine and Inactivation of Human Corona Virus 229E”
- Davide Mariotti, University of Ulster, UK, “Synthesis and Applications of Metal Oxides NPs”
PS-TuP: Plasma Science and Technology Poster Session